Note: This course can be taught in-house
at your facility at any time. Email John
Grant for details.
XPS is used
to determine the atoms present at a surface and their concentrations,
chemistry, and lateral and depth distributions. Depth profiling of thin films
will also be included.
•
Introduction –
terminology, surfaces, types of surfaces.
•
The principles of XPS –
production of photoelectrons, peak labeling, electronic configuration of atoms,
binding energies of atoms, molecules and solids, kinetic energy, spectra, Auger
process, valence spectra, handbooks, books, surface sensitivity, inelastic mean
free path and databases, information depth, hard X-rays (HAXPES), sample
handling, spin-orbit splitting, chemical shift, curve fitting using software,
plasmons, multiplet splitting, shake-up, data
processing to measure intensities of p, d and f doublets.
•
Instrumentation – dual
anode, Bremsstrahlung, satellites and their removal using software,
monochromatic source, electron energy analyzers, spectrum acquisition, energy
resolution, scattering in analyzers, electron detectors, pulse counting,
position sensitive detectors, small area analysis, area location, imaging XPS,
methods for imaging, equipment and examples, software to improve information in
images, energy scale calibration, vacuum system, samples.
•
Qualitative analysis –
identification of elements including examples using software, changing X-ray
sources, charging and its effect on qualitative analysis, interpretation of
chemical shift, relaxation effects, Auger parameter, making Auger parameter
plots online, factors affecting peak widths, lineshapes,
curve fitting with different lineshapes, advanced
curve fitting using reference spectra.
•
Quantitative analysis –
sensitivity factors, ionization cross section, asymmetry parameter, magic
angle, analyzer transmission, reference spectra, peak intensities, background
subtraction with examples using software, measuring peak areas, using software
for quantitative analysis, detection limits with examples, band offsets,
studying curved surfaces.
•
Artifacts – X-ray damage, charging
and software approaches to improve quantitative analysis of data, methods for
charge control, ghost peaks.
•
Depth profiling – non-destructive
and destructive methods, angle resolved XPS (ARXPS) with examples using
software, diffraction, elastic scattering, thickogram,
inelastic loss method with examples using software, effect of thin overlayers
on quantitative analysis, sputtering, depth calibration, examples of data
processing methods to remove peak overlap problems, separate different chemical
states, and improve signal-to-noise in sputter depth profiles.
•
Instrument selection and summary –
factors to consider, general summary.
Some comments from previous students on
the XPS course:
“The material is
extremely valuable, the instructor is without peer, and the course can be made
better only by making it longer.”
“No better course could
be offered anywhere or anytime.”
“Dr. Grant stands alone
in the world in his expertise and teaching ability, and reputation for this
course.”
“The program I attended
is excellent.”
“The cost to value ratio
for this class is very attractive”
“I can recommend to my
management that they send any and every ESCA user to this class without
reservation.”
“Instructor addressed topics at all understanding levels! I would strongly
encourage attendance”
“Dr. Grant is awesome!
Wonderful lectures! He made the concepts very simple.”
“This is
most likely the best class I have ever attended.”